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The temperature dependence of 1.3- and 1.5-/spl mu/m compressively strained InGaAs(P) MQW semiconductor lasers

机译:1.3和1.5 / splμm/ m压缩应变InGaAs(P)MQW半导体激光器的温度依赖性

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We have studied experimentally and theoretically the spontaneous emission from 1.3- and 1.5-/spl mu/m compressively strained InGaAsP multiple-quantum-well lasers in the temperature range 90-400 K to determine the variation of carrier density n with current I up to threshold. We find that the current contributing to spontaneous emission at threshold I/sub Rad/ is always well behaved and has a characteristic temperature T/sub 0/ (I/sub Rad/)/spl ap/T, as predicted by simple theory. This implies that the carrier density at threshold is also proportional to temperature. Below a breakpoint temperature T/sub B/, we find I /spl alpha/ n/sup Z/, where Z=2. And the total current at threshold I/sub th/ also has a characteristic temperature T/sub 0/ (I/sub th/)/spl ap/T, showing that the current is dominated by radiative transitions right up to threshold. Above T/sub B/, Z increases steadily to Z/spl ap/3 and T/sub 0/ (I/sub th/) decreases to a value less than T/3. This behavior is explained in terms of the onset of Auger recombination above T/sub B/; a conclusion supported by measurements of the pressure dependence of I/sub th/. From our results, we estimate that, at 300 K, Auger recombination accounts for 50% of I/sub th/ in the 1.3-/spl mu/m laser and 80% of I/sub th/ in the 1.5-/spl mu/m laser. Measurements of the spontaneous emission and differential efficiency indicate that a combination of increased optical losses and carrier overflow into the barrier and separate confinement heterostructure regions may further degrade T/sub 0/ (I/sub th/) above room temperature.
机译:我们已经从理论和实验上研究了在90-400 K温度范围内1.3和1.5- / splμm/ m压缩应变InGaAsP多量子阱激光器的自发发射,以确定载流子密度n在电流I至阈。我们发现,按照简单理论预测,在阈值I / sub Rad /处自发发射的电流始终表现良好,并具有特征温度T / sub 0 /(I / sub Rad /)/ spl ap / T。这意味着阈值处的载流子密度也与温度成正比。在断点温度T / sub B /以下,我们找到I / spl alpha / n / sup Z /,其中Z = 2。并且,在阈值I / sub th /处的总电流也具有特征温度T / sub 0 /(I / sub th /)/ spl ap / T,这表明电流主要由辐射跃迁控制,直至阈值。在T / sub B /以上,Z稳定地增加到Z / spl ap / 3,T / sub 0 /(I / sub th /)减小到小于T / 3的值。这种现象是根据T / sub B /以上的俄歇重组开始解释的。由压力I / sub th /的测量结果支持的结论。根据我们的结果,我们估计在300 K时,俄歇复合在1.3- / spl mu / m激光器中占I / sub th /的50%,在1.5- / spl mu中占I / sub th /的80% / m激光。对自发发射和差分效率的测量表明,增加的光损耗和载流子溢出进入势垒以及单独的限制异质结构区域的组合可能会进一步使高于室温的T / sub 0 /(I / sub th /)降级。

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