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Possibility of AlN growth using Li-Al-N solvent

机译:使用Li-Al-N溶剂生长AlN的可能性

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摘要

The possibility of AlN growth using Li-Al-N solvent was investigated. Based on theoretical prediction, we selected Li_3N as a suitable nitrogen source for AlN growth. First, vapor phase epitaxy using Li_3N and Al as source materials was performed to confirm the following reaction on the growth surface: Li_3N+Al=AlN+3Li. The results suggest that the reaction proceeds to form AlN on the substrate under appropriate conditions. Next, AlN growth using Li-Al-N solvent was carried out. The Li-Al-N solvent was prepared by annealing of mixtures composed of Li_3N and Al. The results imply that AlN was formed under an Al-rich condition. Moreover, it was found that Li was swept out from AlN grains during growth. The results suggest that AlN growth using Li-Al-N solvent might be a key technology to obtain an AlN crystal boule.
机译:研究了使用Li-Al-N溶剂生长AlN的可能性。根据理论预测,我们选择Li_3N作为AlN生长的合适氮源。首先,使用Li_3N和Al作为原料进行气相外延,以确认在生长表面上发生以下反应:Li_3N + Al = AlN + 3Li。结果表明,在适当的条件下,反应进行以在基底上形成AlN。接下来,使用Li-Al-N溶剂进行AlN生长。通过对由Li_3N和Al组成的混合物进行退火来制备Li-Al-N溶剂。结果暗示AlN在富Al条件下形成。此外,发现在生长期间从AlN晶粒中清除了Li。结果表明,使用Li-Al-N溶剂生长AlN可能是获得AlN晶锭的关键技术。

著录项

  • 来源
    《Journal of Crystal Growth》 |2010年第18期|P.2569-2573|共5页
  • 作者单位

    Research Institute for Applied Mechanics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580, Japan PRESTO, Japan Science and Technology Agency, 4-1-8 Honcho Kawaguchi, Saitama 332-0012, Japan;

    rnResearch Institute for Applied Mechanics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A2. Growth from solutions; B1. Nitrides; B2. Semiconducting III-N materials;

    机译:A2。解决方案的增长;B1。氮化物;B2。半导体III-N材料;
  • 入库时间 2022-08-17 13:19:17

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