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A TCAD approach for non-linear evaluation of microwave power transistor and its experimental verification by LDMOS

机译:微波功率晶体管非线性评估的TCAD方法及其LDMOS的实验验证

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A simulation technique is developed in TCAD to study the non-linear behavior of RF power transistor. The technique is based on semiconductor transport equations to swot up the overall non-linearity's occurring in RF power transistor. Computational load-pull simulation technique (CLP) developed in our group, is further extended to study the non-linear effects inside the transistor structure by conventional two-tone RF signals, and initial simulations were done in time domain. The technique is helpful to detect, understand the phenomena and its mechanism which can be resolved and improve the transistor performance. By this technique, the third order intermodulation distortion (IMD_3) was observed at different power levels. The technique was successfully implemented on a laterally-diffused field effect transistor (LDMOS). The value of IMD_3 obtained is -22 dBc at 1-dB compression point (P_(1dB)) while at 10 dB back off the value increases to -36 dBc. Simulation results were experimentally verified by fabricating a power amplifier with the similar LDMOS transistor.
机译:在TCAD中开发了一种仿真技术来研究RF功率晶体管的非线性行为。该技术基于半导体传输方程,以消除RF功率晶体管中发生的整体非线性。我们小组中开发的计算负载拉模拟技术(CLP)被进一步扩展,以研究常规两音调RF信号对晶体管结构内部的非线性影响,并在时域中进行了初始模拟。该技术有助于检测,理解可解决的现象及其机理并改善晶体管性能。通过这种技术,可以在不同的功率水平上观察到三阶互调失真(IMD_3)。该技术已成功地在横向扩散场效应晶体管(LDMOS)上实现。在1 dB压缩点(P_(1dB))处获得的IMD_3值为-22 dBc,而在退回10 dB时,该值增加到-36 dBc。通过使用类似的LDMOS晶体管制造功率放大器,实验验证了仿真结果。

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