Matrix-seeded growth of nitride semiconductor nanostructures using ion beams

摘要

We have examined the matrix-seeded growth of narrow-gap nitride nanostructures in nitrogen ion implanted GaAs and InAs. Low-energy implantation followed by rapid thermal annealing (RTA) results in the formation of 2-3 nm sized amorphous precipitates in a crystalline matrix. On the other hand, high-energy implantation results in an amorphous layer, with or without crystalline remnants. When the ion-beam-synthesized amorphous matrix is a continuous amorphous layer, subsequent RTA leads to the formation of 4-5 nm zinc blende (ZB)-GaN-rich crystallites in an amorphous matrix. When this matrix contains crystalline remnants, subsequent RTA leads to the formation of 2-4 nm ZB-GaN-rich crystallites within the amorphous regions. These results suggest that the matrix plays an important role in the nucleation and growth of narrow-gap nitride nanostructures, and that matrix-seeded growth may provide an opportunity to control the structure and properties of the nanostructures.