机译:外延阳离子有序PbSc_(0.5)Ta_(0.5)O_3薄膜的结构和铁电性能
Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany,Facuity of Science and Technology, MESA + Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands;
Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany;
Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany,School of Advanced Materials Science & Engineering, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-do 440-746, South Korea;
Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany;
Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany;
机译:脉冲激光沉积制备的外延阳离子序铁电PbSc_(0.5)Ta_(0.5)O_3薄膜
机译:Si(100)上高阳离子序的外延PbSc_(0.5)Ta_(0.5)O_3薄膜的制备和取向控制
机译:(111)取向的高度阳离子有序PbSc_(0.5)Ta_(0.5)O_3薄膜的增强铁电和介电性能
机译:脉冲激光沉积在各种单晶衬底上生长的无铅铁电Na0.5Bi0.5TiO3薄膜的外延生长和性能
机译:通过反应磁控溅射沉积的亚稳态钛(0.5)铝(0.5)铝合金薄膜的物理性能。
机译:可见光至紫外范围内铁电外延K0.5Na0.5NbO3薄膜的光学性质
机译:脉冲激光沉积生长稀土掺杂外延Sr0.5Ba 0.5Nb2O6薄膜的光学性质
机译:用于室温高频可调元件应用的外延铁电Ba(0.5)sr(0.5)TiO3薄膜