首页> 外文期刊>Journal of Applied Physics >Microstructure and ferroelectric properties of epitaxial cation ordered PbSc_(0.5)Ta_(0.5)O_3 thin films grown on electroded and buffered Si(100)
【24h】

Microstructure and ferroelectric properties of epitaxial cation ordered PbSc_(0.5)Ta_(0.5)O_3 thin films grown on electroded and buffered Si(100)

机译:外延阳离子有序PbSc_(0.5)Ta_(0.5)O_3薄膜的结构和铁电性能

获取原文
获取原文并翻译 | 示例

摘要

Epitaxial PbSc_(0.5)Ta_(0.5)O_3 (001) films with an epitaxial LaNiO_3 bottom electrode were deposited on CeO_2/yttria-stabilized zirconia-buffered Si (100) substrates. Crystal orientation, in-plane and out-of-plane lattice parameters, surface morphology, and microstructure were analyzed by X-ray diffraction, X-ray reciprocal lattice mapping measurements, atomic force microscopy, and transmission electron microscopy, respectively. XRD superstructure reflections indicate that the films are cation ordered. Polarization-field and switching current-voltage hysteresis curves were measured at room temperature. The measured spontaneous polarization P_s, remnant polarization P_r, and coercive voltage V_c were found to be 14/μC/cm~2, 4 μC/cm~2, and 1.1 V, respectively, at room temperature. Furthermore, field as well as frequency dependence of the dielectric constant were measured at room temperature. Piezoelectric measurements performed on these PST films showed a sharp non-linearity, which is attributed to the possibility of field induced phase transition and/or percolation of polar nano regions.
机译:外延LaNiO_3底部电极的外延PbSc_(0.5)Ta_(0.5)O_3(001)薄膜沉积在CeO_2 /氧化钇稳定的氧化锆缓冲的Si(100)衬底上。分别通过X射线衍射,X射线往复晶格映射测量,原子力显微镜和透射电子显微镜分析了晶体取向,面内和面外晶格参数,表面形态和微观结构。 XRD的超结构反射表明薄膜是阳离子有序的。在室温下测量极化场和开关电流-电压磁滞曲线。在室温下,测得的自发极化P_s,剩余极化P_r和矫顽电压V_c分别为14 /μC/ cm〜2、4μC/ cm〜2和1.1V。此外,在室温下测量介电常数的场以及频率依赖性。在这些PST薄膜上进行的压电测量显示出尖锐的非线性,这归因于场诱导的相变和/或极性纳米区域渗滤的可能性。

著录项

  • 来源
    《Journal of Applied Physics》 |2013年第8期|084107.1-084107.5|共5页
  • 作者单位

    Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany,Facuity of Science and Technology, MESA + Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands;

    Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany;

    Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany,School of Advanced Materials Science & Engineering, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-do 440-746, South Korea;

    Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany;

    Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle (Saale), Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号