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首页> 外文期刊>Journal of Applied Physics >Silicon vacancy color center photoluminescence enhancement in nanodiamond particles by isolated substitutional nitrogen on {100} surfaces
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Silicon vacancy color center photoluminescence enhancement in nanodiamond particles by isolated substitutional nitrogen on {100} surfaces

机译:{100}表面上的孤立取代氮增强纳米金刚石颗粒中的硅空位色中心光致发光

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摘要

Fluorescent nanodiamonds were produced by incorporation of silicon-vacancy (Si-V) defect centers in as-received diamonds of averaged size ~255nm using microwave plasma chemical vapor deposition. The potential for further enhancement of Si-V emission in nanodiamonds (NDs) is demonstrated through controlled nitrogen doping by adding varying amounts of N_2 in a H_2 + CH4 feedgas mixture. Nitrogen doping promoted strong narrow-band (FWHM ~ 10 nm) emission from the Si-V defects in NDs, as confirmed by room temperature photoluminescence. At low levels, isolated substitutional nitrogen in j 100} growth sectors is believed to act as a donor to increase the population of optically active (Si-V)~- at the expense of optically inactive Si-V defects, thus increasing the observed luminescence from this center. At higher levels, clustered nitrogen leads to deterioration of diamond quality with twinning and increased surface roughness primarily on {111} faces, leading to a quenching of the Si-V luminescence. Enhancement of the Si-V defect through controlled nitrogen doping offers a viable alternative to nitrogen-vacancy defects in biolabeling/ sensing applications involving sub-10nm diamonds for which luminescent activity and stability are reportedly poor.
机译:荧光纳米金刚石是通过使用微波等离子体化学气相沉积法将硅空位(Si-V)缺陷中心掺入平均尺寸约为255nm的已接收钻石中制成的。通过在H_2 + CH4进料气混合物中添加不同量的N_2,通过控制氮掺杂,可以进一步提高纳米金刚石(NDs)中Si-V的释放潜力。室温光致发光证实,氮掺杂促进了NDs中Si-V缺陷的强窄带(FWHM〜10 nm)发射。在低水平下,j 100}生长区中孤立的替代氮被认为是作为供体,以增加光学活性(Si-V)〜-的数量,但以光学惰性Si-V缺陷为代价,从而增加了观察到的发光从这个中心。在较高含量下,聚集的氮会导致金刚石质量下降,并产生孪晶并主要在{111}面上增加表面粗糙度,从而导致Si-V发光淬灭。在涉及低于10nm金刚石的生物标记/传感应用中,通过控制氮掺杂来增强Si-V缺陷提供了一种替代氮空位缺陷的可行方法,据报道,这种金刚石的发光活性和稳定性均较差。

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  • 来源
    《Journal of Applied Physics》 |2013年第4期|044701.1-044701.6|共6页
  • 作者

    Sonal Singh; Shane A. Catledge;

  • 作者单位

    Department of Physics, Center for Nanoscale Materials and Biointegration (CNMB), University of Alabama at Birmingham, Birmingham, Alabama 35294-1170, USA;

    Department of Physics, Center for Nanoscale Materials and Biointegration (CNMB), University of Alabama at Birmingham, Birmingham, Alabama 35294-1170, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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