Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO_2 thin films grown by the atomic layer deposition technique

摘要

Dielectric spectroscopy is carried out for intrinsic and aluminum-doped TiO_2 rutile films which are deposited on RuO_2 by the atomic layer deposition technique. Capacitance and conductance are measured in the 0.1 Hz-100kHz range, for ac electric fields up to 1 MV_(rms)/cm. Intrinsic films have a much lower dielectric constant than rutile crystals. This is ascribed to the presence of oxygen vacancies which depress polarizability. When Al is substituted for Ti, the dielectric constant further decreases. By considering Al-induced modification of polarizability, a theoretical relationship between the dielectric constant and the Al concentration is proposed. Al doping drastically decreases the loss in the very low frequency part of the spectrum. However, Al doping has almost no effect on the loss at high frequencies. The effect of Al doping on loss is discussed through models of hopping transport implying intrinsic oxygen vacancies and Al related centers. When increasing the ac electric field in the MV_(rms)/cm range, strong voltage non-linearities are evidenced in undoped films. The conductance increases exponentially with the ac field and the capacitance displays negative values (inductive behavior). Hopping barrier lowering is proposed to explain high-field effects. Finally, it is shown that Al doping strongly improves the high-field dielectric behavior.