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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Structural and Optical Properties of ZnO Epitaxial Films Grown on Al_2O_3 (1120) Substrates by Metalorganic Chemical Vapor Deposition
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Structural and Optical Properties of ZnO Epitaxial Films Grown on Al_2O_3 (1120) Substrates by Metalorganic Chemical Vapor Deposition

机译:金属有机化学气相沉积法在Al_2O_3(1120)衬底上生长的ZnO外延膜的结构和光学性质

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摘要

ZnO films of different thicknesses were grown on Al_2O_3 (1120) substrates by metalorganic chemical vapor deposition. Characterizations using X-ray diffraction and scanning electron microscopy demonstrated the transition from two-dimensional growth to three-dimensional growth with an increase in film thickness. Photoluminescence spectra revealed the thickness dependence of the exciton peak and a stimulated emission due to exciton-exciton scattering was observed.
机译:通过金属有机化学气相沉积在Al_2O_3(1120)衬底上生长了不同厚度的ZnO薄膜。使用X射线衍射和扫描电子显微镜的表征表明,随着膜厚的增加,从二维生长过渡到三维生长。光致发光光谱揭示了激子峰的厚度依赖性,并且观察到由于激子-激子散射引起的受激发射。

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