首页> 外文期刊>Japanese journal of applied physics >Physical Mechanism of Buffer-Related Current Transients and Current Slump in AlGaN/GaN High Electron Mobility Transistors
【24h】

Physical Mechanism of Buffer-Related Current Transients and Current Slump in AlGaN/GaN High Electron Mobility Transistors

机译:AlGaN / GaN高电子迁移率晶体管中与缓冲有关的电流瞬态和电流降低的物理机制

获取原文
获取原文并翻译 | 示例

摘要

Two-dimensional transient analyses of AlGaN/GaN high electron mobility transistors (HEMTs) are performed in which a deep donor and a deep acceptor are considered in a buffer layer. Quasi-pulsed current-voltage (I-V) curves are derived from the transient characteristics. When the drain voltage is raised abruptly, electrons are injected into the buffer layer and captured by deep donors, and when it is lowered abruptly, the drain currents remain at low values for some periods and begin to increase slowly as the deep donors begin to emit electrons, showing drain-lag behavior. The gate lag could also occur due to deep levels in the buffer layer, and it is correlated with relatively high source access resistance in AlGaN/GaN HEMTs. It is shown that the current slump is more pronounced when the deep-acceptor density in the buffer layer is higher and when an off-state drain voltage is higher, because the trapping effects become more significant. The drain lag could be a major cause of current slump in the case of higher off-state drain voltage. It is suggested that to minimize current slump in AlGaN/GaN HEMTs, an acceptor density in the buffer layer should be made low, although there may be a trade-off relationship between reducing current slump and obtaining sharp current cutoff.
机译:对AlGaN / GaN高电子迁移率晶体管(HEMT)进行了二维瞬态分析,其中在缓冲层中考虑了深施主和深受主。准脉冲电流-电压(I-V)曲线由瞬态特性得出。当漏极电压突然升高时,电子被注入到缓冲层中并被深的施主俘获;当漏极电压突然降低时,漏极电流会在一段时间内保持较低的值,并随着深的施主开始发射而缓慢增加电子,显示出漏滞现象。栅极滞后也可能由于缓冲层中的深层而发生,并且与AlGaN / GaN HEMT中相对较高的源极访问电阻相关。结果表明,当缓冲层中的深受体密度较高且截止状态的漏极电压较高时,电流陷落更为明显,因为俘获效应变得更加明显。在较高的关态漏极电压下,漏极滞后可能是电流下降的主要原因。建议将AlGaN / GaN HEMT中的电流骤降降至最低,尽管在降低电流骤降与获得陡峭的电流截止之间可能存在权衡关系,但应降低缓冲层中的受体密度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号