机译:溅射功率和衬底温度变化的氧化锌薄膜的形貌演变
Department of Physics and Astronomy, National Institute of Technology,Rourkela 769008, India;
Department of Physics and Astronomy, National Institute of Technology,Rourkela 769008, India;
Department of Physics and Astronomy, National Institute of Technology,Rourkela 769008, India;
FST, IFHE University,Hyderabad 501203, India;
Department of Materials Science and Engineering,Yonsei University,Seoul 120749, South Korea;
Department of Bio-Nanotechnology,Gachon University,Gyeonggi-do 461701, South Korea;
Department of Materials Science and Engineering,Yonsei University,Seoul 461701, South Korea;
Department of Physics and Astronomy,National Institute of Technology,Rourkela 769008, India;
zinc oxide; sputtering; RF power; substrate temperature; microstructures;
机译:射频磁控溅射在不同衬底温度和溅射功率下表征铝掺杂氧化锌薄膜
机译:反应溅射沉积氧化物薄膜:溅射功率和衬底温度对微观结构,形态和电性能的影响
机译:适用于光电应用的各种衬底温度下溅射的铝掺杂氧化锌薄膜的多模AFM分析
机译:不同底物温度下RF溅射沉积的氧化锌薄膜的形态学和光致发光分析
机译:氢退火和衬底温度对射频溅射氧化锌薄膜性能的影响
机译:在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
机译:不同底物温度下RF溅射沉积的氧化锌薄膜的形态学和光致发光分析
机译:薄溅射镍合金(Kovar)薄膜的结构和形态与衬底温度的关系。