MANUFACTURING METHOD OF ZINC OXIDE-BASED THIN FILM AND A TRANSPARENT OXIDE CONDUCTIVE FILM WITH THE HIGH TRANSMITTANCE BY A SPUTTERING METHOD USING A HIGH DENSITY ZINC OXIDE-BASED SPUTTERING TARGET

摘要

PURPOSE: A manufacturing method of zinc oxide-based thin film and a transparent oxide conductive film is provided to apply the thin film or the conductive film to a transparent electrode of a flat panel display by a polycrystalline structure.;CONSTITUTION: A manufacturing method of zinc oxide-based thin film and a transparent oxide conductive film comprises the following steps: adding 0.01~0.5% of oxide selected from the group consisting of divalent metals; dispersing 0.5~10% of more than two oxides selected form the group consisting of trivalent metals including Al2O3, Ga2O3, In2O3; adding the balance of zinc oxide-based sintered material with the density of 5.6~5.74g/cubic centimeter; heating a substrate and forming a thin film on the substrate by sputtering using the zinc oxide-based sintered material; and heat-processing the thin film.;COPYRIGHT KIPO 2011