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Zinc oxide sintered oxide, zinc oxide based thin film obtained by sputtering a zinc oxide-based sputtering target and the target consisting of the sintered body

机译:氧化锌烧结氧化物,通过溅射氧化锌基溅射靶而获得的氧化锌基薄膜和由烧结体组成的靶

摘要

Zinc oxide (ZnO) as a main component, while containing gallium as the n-type dopant with respect to zinc oxide (Ga) or aluminum (Al) or boron (B), carbon containing 10~300Wtppm, and cobalt selected from (Co), nickel (Ni), iron (Fe), copper (Cu), molybdenum (Mo), ruthenium (Ru), rhodium (Rh), tungsten (W), iridium (Ir), gold (Au) metal to be contained at least one metal element M, the metal M is at least some or all remains in the sintered body as a metal, zinc constituting the zinc oxide-based sintered body and the n-type dopant and the total metal elements concentration from 0.05 to 25.0 zinc oxide based sintered adjusted to atomic% of M, sputtering a sputtering target and the target consisting of the sintered body To provide a thin film obtainable by a. .BACKGROUND
机译:以氧化锌(ZnO)为主要成分,相对于氧化锌(Ga)或铝(Al)或硼(B)含有镓作为n型掺杂剂,碳含量为10〜300Wtppm和选自(Co ),镍(Ni),铁(Fe),铜(Cu),钼(Mo),钌(Ru),铑(Rh),钨(W),铱(Ir),金(Au)金属至少一种金属元素M,金属M是至少一部分或全部残留在金属中的金属,构成氧化锌基烧结体的锌和n型掺杂剂以及金属元素的总浓度为0.05至25.0通过将氧化锌系烧结体调整为M的原子%,溅射溅射靶和由该烧结体构成的靶,从而可以得到通过a得到的薄膜。 。背景

著录项

  • 公开/公告号JPWO2014054361A1

    专利类型

  • 公开/公告日2016-08-25

    原文格式PDF

  • 申请/专利权人 JX金属株式会社;

    申请/专利号JP20140519327

  • 发明设计人 高見 英生;奈良 淳史;

    申请日2013-09-02

  • 分类号C04B35/453;C23C14/34;C23C14/08;

  • 国家 JP

  • 入库时间 2022-08-21 14:40:56

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