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Zinc oxide sintered oxide, zinc oxide based thin film obtained by sputtering a zinc oxide-based sputtering target and the target consisting of the sintered body
Zinc oxide sintered oxide, zinc oxide based thin film obtained by sputtering a zinc oxide-based sputtering target and the target consisting of the sintered body
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机译:氧化锌烧结氧化物,通过溅射氧化锌基溅射靶而获得的氧化锌基薄膜和由烧结体组成的靶
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摘要
Zinc oxide (ZnO) as a main component, while containing gallium as the n-type dopant with respect to zinc oxide (Ga) or aluminum (Al) or boron (B), carbon containing 10~300Wtppm, and cobalt selected from (Co), nickel (Ni), iron (Fe), copper (Cu), molybdenum (Mo), ruthenium (Ru), rhodium (Rh), tungsten (W), iridium (Ir), gold (Au) metal to be contained at least one metal element M, the metal M is at least some or all remains in the sintered body as a metal, zinc constituting the zinc oxide-based sintered body and the n-type dopant and the total metal elements concentration from 0.05 to 25.0 zinc oxide based sintered adjusted to atomic% of M, sputtering a sputtering target and the target consisting of the sintered body To provide a thin film obtainable by a. .BACKGROUND
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