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Two-Dimensional Device Simulation of 0.05μm-Gate AlGaN/GaN HEMT

机译:0.05μm栅极AlGaN / GaN HEMT的二维器件仿真

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摘要

DC and RF performances of AlGaN/GaN HEMTs are simulated using a two-dimensional device simulator with the material parameters of GaN and AlGaN. The cut-off frequency is estimated as 205 GHz at the gate length of 0.05μm and the drain breakdown voltage at this gate length is over 10 V. The values are satisfactory for millimeter wavelength power applications. The use of thin AlGaN layers has key importance to alleviate gate parasitic capacitance effects at this gate length.
机译:使用具有GaN和AlGaN的材料参数的二维设备模拟器来模拟AlGaN / GaN HEMT的DC和RF性能。在栅极长度为0.05μm时,截止频率估计为205 GHz,并且该栅极长度的漏极击穿电压超过10V。该值对于毫米波长功率应用而言是令人满意的。薄AlGaN层的使用对于缓解在此栅极长度处的栅极寄生电容效应至关重要。

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