Fabrication of silicon strip detectors using a step-and-repeat lithography system

摘要

The use of a step-and-repeat lithography system (stepper) for the fabrication of silicon detectors is described. A technique was used which overcomes the field size limitation and allows fabrication of large-area strip detectors with a wafer stepper. This technique essentially consists of the precise, repetitive placement of strip patterns on the wafer. Prototype detectors using this method have been fabricated and tested. In addition to the inherent advantages of a step-and-repeat system, this technique offers great flexibility in the fabrication of large-area strip detectors since the length and width of the detector can be changed by simply reprogramming the stepper computer. The technique is presented, followed by experimental results from the first prototype.