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The effect of power supply voltage scaling on the total dose radiation response of fully-depleted SOI MOS transistors

机译:电源电压缩放对完全耗尽的SOI MOS晶体管的总剂量辐射响应的影响

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摘要

The radiation induced front channel threshold voltage shift (/spl Delta/V/sub tl/) of fully-depleted MOSFETs fabricated in SIMOX is investigated and analyzed as a function of power supply voltage (V/sub DD/) from 5.5 to 1.2 volts. This work shows that the expected improvement in front channel radiation hardness by reducing V/sub DD/ is not fully realized due to (1) a radiation induced off-set voltage at V/sub DD//spl sim/0 V, and (2) enhanced coupling of the buried oxide charge to the front channel.
机译:研究并分析了SIMOX中制造的全耗尽MOSFET的辐射引起的前沟道阈值电压偏移(/ spl Delta / V / sub tl /)与电源电压(V / sub DD /)在5.5至1.2伏之间的函数关系。这项工作表明,由于(1)辐射在V / sub DD // spl sim / 0 V时引起的偏移电压不能完全实现通过降低V / sub DD /来改善前通道辐射硬度的预期效果,并且( 2)增强了掩埋氧化物电荷与前沟道的耦合。

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