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A Deep Level Transient Spectroscopy Study of Electron and Proton Irradiated GaAs Diodes

机译:电子和质子辐照GaAs二极管的深层瞬态光谱研究

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Defects produced by 0.6 MeV, 1 MeV and 5 MeV electrons are compared with those produced by 2 MeV proton irradiations in ${hbox {p}} ^{+} {hbox {n}}$ GaAs diodes using Deep Level Transient Spectroscopy (DLTS). Following 0.6 and 1 MeV electron irradiation, the measured DLTS spectra matched that of the literature. After 5 MeV electron irradiation, however, a new DLTS peak was observed. The new peak is located on the low temperature side of the common E3 peak. This new electron-induced DLTS peak is assigned to be the same peak produced by proton irradiation and commonly labeled PR4$^{primeprime}$ . Further analysis of the DLTS data indicate that the PR4$^{primeprime}$ peak is independent of the displacement damage dose deposited but is dependent on the primary recoil energy.
机译:使用深电平瞬态光谱法(DLTS),在$ {hbox {p}} ^ {+} {hbox {n}} $ GaAs二极管中,将0.6 MeV,1 MeV和5 MeV电子产生的缺陷与2 MeV质子辐照产生的缺陷进行比较。 )。在0.6和1 MeV电子辐照后,测得的DLTS光谱与文献中的相符。但是,在5 MeV电子辐照后,观察到新的DLTS峰。新峰位于普通E3峰的低温侧。该新的电子诱导的DLTS峰被指定为与质子辐照产生的峰相同,并通常标记为PR4 $ ^ {primeprime} $。 DLTS数据的进一步分析表明PR4 ^ {primeprime} $峰与沉积的位移损伤剂量无关,但与主要后坐力有关。

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