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Total Dose Irradiation-Induced Degradation of Hysteresis Effect in Partially Depleted Silicon-on-Insulator NMOSFETs

机译:总剂量辐照导致部分耗尽的绝缘体上硅NMOSFET的磁滞效应降低

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摘要

In this work, we present a study of hysteresis effect degradation induced by total dose irradiation in partially depleted SOI nMOSFETs with floating bodies. In addition to traditional linear kink effect, evidence is provided for a new hysteresis effect which occurs in output characteristics during the forward and reverse sweeps. For the first time, it is shown that at a sufficiently high irradiation level, the hysteresis behaviors both in transfer and output characteristics vanish due to interface traps and oxide trapped charge. 3D process and device simulations are performed to investigate the combined effects of charge trapping in oxide and interface traps.
机译:在这项工作中,我们提出了在具有浮体的部分耗尽SOI nMOSFET中由总剂量辐照引起的磁滞效应退化的研究。除了传统的线性扭结效应外,还提供了一种新的磁滞效应的证据,该磁滞效应会在正向和反向扫描期间出现在输出特性中。首次表明,在足够高的辐照水平下,由于界面陷阱和氧化物陷阱电荷,传输和输出特性中的磁滞行为都消失了。进行3D工艺和器件仿真以研究氧化物和界面陷阱中电荷陷阱的综合作用。

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