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Improved Modeling of GaN HEMTs on Si Substrate for Design of RF Power Amplifiers

机译:用于RF功率放大器设计的Si衬底上GaN HEMT的改进建模

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摘要

An improved large-signal modeling approach of GaN on Si devices for RF high-power applications is presented. This approach accounts for the parasitic buffer loading effect under microwave RF operation in addition to the self-heating and trapping effects associated with high-power operation conditions. A hybrid optimization (genetic and Simplex) technique based procedure is used to determine the optimal values of the model extrinsic elements. These elements are de-embedded from multibias $S$ -parameter measurements to find the intrinsic part of the device, which is then used to construct a nonlinear current-charge (represented by nonlinear charge and current sources) based model for the gate current of the device. Pulsed and static dc IV characteristics are used for modeling of the drain current. The validity of the developed modeling approach is verified by comparing simulated large-signal single- and two-tone simulation with measured data of a 2-mm $({hbox {10}}times {hbox {200}} mu{hbox {m}})$ GaN HEMT on Si substrate. The model has been employed for designing a class-AB power amplifier. Very good agreement between the amplifier simulation and measurement shows the validity of the model.
机译:提出了一种改进的用于射频大功率应用的硅基氮化镓器件的大信号建模方法。除了与大功率工作条件相关的自发热和俘获效应外,这种方法还考虑了微波射频工作下的寄生缓冲器负载效应。基于混合优化(遗传和单纯形)技术的过程用于确定模型外部元素的最佳值。这些元件从多偏置$ S $参数测量中去嵌入,以找到器件的固有部分,然后将其用于构建基于非线性电流-电荷(由非线性电荷和电流源表示)的模型,以用于栅极电流。装置。脉冲和静态直流IV特性用于漏极电流建模。通过将模拟的大信号单音和两音模拟与2毫米$({hbox {10}}倍{hbox {200}} mu {hbox {m }})$ Si衬底上的GaN HEMT。该模型已用于设计AB类功率放大器。放大器仿真和测量之间的很好一致性表明了该模型的有效性。

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