AlInP–AlGaInP Quantum-Well Lasers Grown by Molecular Beam Epitaxy

摘要

We have examined a possibility to use an Al $_{x}$In $_{1 - {x}}$P layer as an active region of a 650-nm semiconductor laser. Encouraging results have been obtained with compressively strained oxide-stripe AlInP–AlGaInP quantum-well lasers, which operated in continuous-wave mode at room temperature, producing an optical power of 460 and 320 mW per uncoated facet at 10 $^{circ}$C and 20 $^{circ}$C, respectively. In pulsed mode, a power level of 780 mW/facet was achieved at 2-A drive current at 5 $^{circ}$C. The results indicate that wide-bandgap AlInP affords an opportunity to develop lasers for the wavelengths $600leq lambda leq 650$ nm, which is difficult to achieve by any semiconductor heterostructure.