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首页> 外文期刊>IEEE Electron Device Letters >Potential Vulnerability of Dynamic CMOS Logic to Soft Gate Oxide Breakdown
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Potential Vulnerability of Dynamic CMOS Logic to Soft Gate Oxide Breakdown

机译:动态CMOS逻辑对软栅氧化层击穿的潜在漏洞

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摘要

The effect of gate oxide breakdown on a circuit designed to emulate a principle of dynamic CMOS logic is studied experimentally. Retention time of a soft node in the circuit is found to strongly decrease after a soft gate oxide breakdown path leading to the node is created in a pass transistor. Based on this observation, it is argued that some soft breakdowns may degrade soft node retention time below the time necessary for successful evaluation of the nodes charge. Consequently, a soft breakdown event in a dynamic CMOS circuit relying on unconnected soft nodes may result in the failure of the circuit.
机译:实验研究了栅极氧化物击穿对模拟动态CMOS逻辑原理的电路的影响。发现在传输晶体管中创建通向该节点的软栅极氧化物击穿路径后,电路中的软节点的保留时间将大大减少。基于此观察结果,有人认为某些软故障可能会使软节点的保留时间降到低于成功评估节点电荷所需的时间以下。因此,依赖于未连接的软节点的动态CMOS电路中的软击穿事件可能会导致电路故障。

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