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A passive mitigation strategy of impurity deposition on the first mirrors using duct with baffles: A case study at a port of KSTAR with in-situ deposition monitoring

机译:使用带挡板的导管被动降低第一面镜子上的杂质沉积的策略:以KSTAR港口的原位沉积监测为例

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摘要

We report our recent investigation on a passive mitigation strategy of the mirror deposition in magnetically confined fusion (MCF) devices, employing a newly designed duct system with baffles at KSTAR tokamak. Our mitigation strategy of the first mirror deposition is to suppress the deposition of impurity species onto the first mirror by confining inert gas such as helium in the duct with baffles located in front of the first mirror. To achieve this final goal, feasibility of this technique at a real tokamak was investigated with regard to the effect on the plasma condition in this paper. To assess the effect of the helium gas flow on the plasma condition, 5 sccm amount of helium gas was injected into the duct for about 70% of shots in the year 2016. This quantity of helium gas was found to be insignificant in terms of the effect on plasma performance. To estimate the deposition quantity on the sample during plasma operation in-situ, quartz crystal microbalances (QCMs) were also installed for thickness detection in real time at KSTAR. The net deposition rates of these samples at KSTAR were about 0.6-40 ng/h cm(2) (2.7 x 10(-3)-0.18 nm/h (graphite)) depending on the kinds of operations such as plasma shots,. glow discharge cleaning, and baking of the tokamak first wall. We found that the most detrimental condition with regard to the mirror deposition rate at KSTAR is the glow discharge wall cleaning (GDC) in the baking condition.
机译:我们报告了我们最近对磁约束聚变(MCF)设备中的镜面沉积的被动缓解策略的研究,该技术在KSTAR托卡马克采用了带有挡板的新设计的风道系统。我们对第一反射镜沉积的缓解策略是通过将惰性气体(例如氦气)限制在导管中,并在第一反射镜的前面放置挡板,以抑制杂质种类在第一反射镜上的沉积。为了达到这个最终目的,本文针对等离子体条件的影响,研究了在真正的托卡马克上使用该技术的可行性。为了评估氦气流量对等离子体条件的影响,2016年向管道中注入了5 sccm量的氦气,注入量约为70%。对血浆性能的影响。为了估算在原位等离子体操作过程中样品上的沉积量,还安装了石英晶体微量天平(QCM),用于在KSTAR进行实时厚度检测。这些样品在KSTAR上的净沉积速率约为0.6-40 ng / h cm(2)(2.7 x 10(-3)-0.18 nm / h(石墨)),具体取决于操作的种类,例如等离子注入。辉光放电清洁,并烘烤托卡马克的第一壁。我们发现,对于KSTAR处的镜面沉积速率而言,最有害的条件是烘烤条件下的辉光放电壁清洁(GDC)。

著录项

  • 来源
    《Fusion Engineering and Design》 |2018年第4期|269-276|共8页
  • 作者单位

    Ajou Univ, Dept Energy Syst Res, Suwon 16499, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

    Ajou Univ, Dept Energy Syst Res, Suwon 16499, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

    Natl Fus Res Inst, Gwahangro 169-148, Daejeon 34133, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Duct with baffles; Deposition mitigation; Mirror deposition; Gas pressurization;

    机译:带挡板的风管;减缓沉积;镜面沉积;气体加压;

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