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Modeling electron transport in InGaAs-based resonant-tunneling hot-electron transistors

机译:在基于InGaAs的谐振隧道热电子晶体管中模拟电子传输

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摘要

The modeling of the resonant-tunneling hot-electron transistor (RHET) is described. In an analysis of the resonant-tunneling barrier, the Schrodinger and Poisson equations are solved self-consistently. The electron transport in the base and the collector barrier region is simulated using the Monte Carlo method, taking account of the space charge in the collector barrier. The model used includes the effect of coupled plasmon-LO phonon scattering and electron-electron scattering in the base region. The transit time is calculated in the base and the collector barrier region. The 50-nm base transient time is 0.059 ps. On the other hand, the 200-nm collector barrier transit time is larger than 1 ps due to intervalley scattering in the collector barrier region. it is shown that the collector barrier transit time can be reduced to 0.089 ps in the 50-nm collector barrier RHET at a collector-base voltage of 0.5 V.
机译:描述了谐振隧道热电子晶体管(RHET)的建模。在对谐振隧道势垒的分析中,Schrodinger和Poisson方程是自洽求解的。考虑到集电极势垒中的空间电荷,使用蒙特卡罗方法模拟了基极和集电极势垒区域中的电子传输。使用的模型包括在基极区域中耦合的等离振子-LO声子散射和电子-电子散射的影响。在基极和集电极势垒区域中计算渡越时间。 50 nm基本瞬态时间为0.059 ps。另一方面,由于在集电极势垒区域中的间隔散射,200nm的集电极势垒渡越时间大于1ps。结果表明,在集电极-基极电压为0.5 V的情况下,在50 nm的集电极势垒RHET中,集电极势垒的穿越时间可以降低至0.089 ps。

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