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Room-temperature operation of InGaAs-based hot-electron transistors

机译:基于InGaAs的热电子晶体管的室温操作

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Summary form only given. It is demonstrated that 300-K operation of an InGaAs-based HET (hot-electron transistor) can be achieved by further increasing the electron injection energy in combination with the use of a wide-bandgap base-collector isolation barrier. The characteristics of a device consisting of an InAlAs emitter, a 10-AA AlAs tunnel-barrier positioned at the emitter-base heterojunction, a 400-AA n+ InGaAs base region, and a 2500-AA InAlGaAs collector barrier are reported. The injected electrons are transported across the base region with over 80% efficiency, as measured in a common-base configuration. The maximum common-emitter current gain in this nonoptimized transistor is nearly four with an f/sub T/ of over 40 GHz and a base-collector breakdown voltage of 1.5 V. A systematic study of RHET (resonant tunneling HET) injector and collection properties indicates that the HET can operate at room temperature with a current gain on the order of 100. 300-K operation of a single-RHET, exclusive-NOR integrated circuit that is similar in design to the one demonstrated at 77 K by N. Yokoyama et al. (1985) is also shown.
机译:仅提供摘要表格。结果表明,结合宽带隙基极-集电极隔离势垒,可以进一步提高电子注入能量,从而实现基于InGaAs的HET(热电子晶体管)的300-K操作。报道了由InAlAs发射极,位于发射极-基极异质结处的10-AA AlAs隧道势垒,400-AA n + InGaAs基极区和2500-AA InAlGaAs集电极势垒组成的器件的特性。注入的电子以超过80%的效率跨过基极区域传输,这是在普通基极配置中测得的。该非优化晶体管的最大共发射极电流增益接近四倍,f / sub T /超过40 GHz,基极-集电极击穿电压为1.5V。RHET(谐振隧穿HET)注入器和收集特性的系统研究表示HET可以在室温下以100的电流增益工作。单个RHET异或非集成电路的300-K操作类似于N. Yokoyama在77 K上演示的设计。等。 (1985)也显示。

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