首页> 外文期刊>IEEE Transactions on Electron Devices >Ga/sub 0.51/In/sub 0.49/P/GaAs HEMT's exhibiting good electrical performance at cryogenic temperatures
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Ga/sub 0.51/In/sub 0.49/P/GaAs HEMT's exhibiting good electrical performance at cryogenic temperatures

机译:Ga / sub 0.51 / In / sub 0.49 / P / GaAs HEMT在低温下表现出良好的电性能

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摘要

The DC and microwave characteristics of Ga/sub 0.51/In/sub 0.49/P/GaAs HEMTs grown by metalorganic chemical vapor deposition (MOCVD) are presented. Devices with 1- mu m-long gates show transconductances of 163 and 213 mS/mm at 300 and 77 K, respectively. Their maximum cutoff frequency is 17.8 GHz. Deep traps in the doped layer are evaluated at low temperature by the threshold voltage shift and current collapse phenomena. GaInP/GaAs HEMTs show no current collapse and have almost zero threshold voltage shift compared to AlGaAs/GaAs and InAlAs/InGaAs where the corresponding values are 0.5 and 0.25 V, respectively.
机译:介绍了通过金属有机化学气相沉积(MOCVD)生长的Ga / sub 0.51 / In / sub 0.49 / P / GaAs HEMT的直流和微波特性。栅极长度为1μm的器件在300 K和77 K时的跨导分别为163和213 mS / mm。它们的最大截止频率为17.8 GHz。在低温下,通过阈值电压偏移和电流崩溃现象来评估掺杂层中的深陷阱。与AlGaAs / GaAs和InAlAs / InGaAs分别为0.5和0.25 V的AlGaAs / GaAs和InAlAs / InGaAs相比,GaInP / GaAs HEMT没有电流崩溃,阈值电压漂移几乎为零。

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