首页> 外文期刊>IEEE Electron Device Letters >Temperature-dependent investigation of a high-breakdown voltage and low-leakage current Ga/sub 0.51/In/sub 0.49/P/In/sub 0.15/Ga/sub 0.85/As pseudomorphic HEMT
【24h】

Temperature-dependent investigation of a high-breakdown voltage and low-leakage current Ga/sub 0.51/In/sub 0.49/P/In/sub 0.15/Ga/sub 0.85/As pseudomorphic HEMT

机译:高击穿电压和低漏电流Ga / sub 0.51 / In / sub 0.49 / P / In / sub 0.15 / Ga / sub 0.85 / As拟态HEMT的温度相关研究

获取原文
获取原文并翻译 | 示例

摘要

We reported a newly designed double delta-doped GaInP/InGaAs pseudomorphic HEMT with high temperature-dependent performances. In addition to the novel aspects of the proposed HEMT structure, temperature-dependent behaviors including a high-voltage (40 V) and a low-leakage current (17 nA/mm) are further improved by eliminating mesa-sidewall effect. We obtained nearly current-independent transconductance in the temperature of 300-450 K. The measured current gain cutoff frequency f/sub T/ and maximum oscillation frequency f/sub max/ for a 1-/spl mu/m gate device are 12 and 28.4 GHz, respectively.
机译:我们报道了一种新设计的双δ掺杂GaInP / InGaAs假晶HEMT,具有高温依赖性。除了提出的HEMT结构的新颖性之外,通过消除台面侧壁效应,进一步改善了包括高电压(40 V)和低泄漏电流(17 nA / mm)的温度相关行为。我们在300-450 K的温度下获得了几乎与电流无关的跨导。对于1- / spl mu / m栅极器件,测得的电流增益截止频率f / sub T /和最大振荡频率f / sub max /为12和28.4 GHz。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号