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Pseudomorphic Ga0.51In0.49P/In0.15Ga0.85As/GaAs HIGFET's.

机译:假晶Ga0.51In0.49p / In0.15Ga0.85as / Gaas HIGFET。

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摘要

Ga0.51In0.49P/In0.15Ga0.85As HIGFET's were realized by MOCVD growth on Gallium ARSENATE substrates. This heterostructure system allows very high gate voltage operation with minimum gate leakage and cryogenic operation with very small threshold voltage shift. N an P channel devices were realized with a maximum intrinsic transconductance of 184 mS/mm and 74 mS/mm respectively.

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