首页> 外文期刊>IEEE Transactions on Electron Devices >In/sub 0.52/Al/sub 0.48/As/In/sub x/Ga/sub 1-x/As (0.53>or=x>or=0.70) lattice-matched and strained heterostructure insulated-gate FETs
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In/sub 0.52/Al/sub 0.48/As/In/sub x/Ga/sub 1-x/As (0.53>or=x>or=0.70) lattice-matched and strained heterostructure insulated-gate FETs

机译:In / sub 0.52 / Al / sub 0.48 / As / In / sub x / Ga / sub 1-x / As(0.53> == x>或= 0.70)晶格匹配且应变的异质结构绝缘栅FET

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摘要

The DC and microwave properties of In/sub 0.52/Al/sub 0.48/Al/In/sub x/Ga/sub 1-x/As (0.53>or=x>or=0.70) heterostructure insulated gate field-effect transistors (HIGFETs) with a quantum well channel design are presented. DC and microwave transconductances (g/sub m/) are enhanced as the In content is increased in the InGaAs channel. An intrinsic microwave g/sub m/ value of 428 mS/mm and a K-factor of 1140 mS/mm-V have been obtained for 1.0- mu m gate length with the 65% In channel devices. The sheet charge density, drift mobility, transconductance, current-gain cutoff frequency (f/sub T/), and maximum oscillation frequency (f/sub max/) all show a continuous improvement up to 65% In content (f/sub T/=22.5 GHz with 53% and f/sub T/=27 GHz with 65% In; the corresponding f/sub max/ change is from 6.5 to 8 GHz). The device performance degrades as the In content is increased to 70%. DC and microwave characteristics show the presence of negative differential resistance (NDR) up to 2.7 GHz.
机译:In / sub 0.52 / Al / sub 0.48 / Al / In / sub x / Ga / sub 1-x / As(0.53>或= x>或= 0.70)异质结构绝缘栅场效应晶体管的直流和微波特性提出了具有量子阱通道设计的HIGFET。随着InGaAs通道中In含量的增加,直流和微波跨导(g / sub m /)会增加。使用65%In通道器件,对于1.0μm的栅极长度,已获得428 mS / mm的固有微波g / sub m /值和1140 mS / mm-V的K系数。薄层电荷密度,漂移迁移率,跨导,电流增益截止频率(f / sub T /)和最大振荡频率(f / sub max /)都显示出高达65%的含量(f / sub T / = 22.5 GHz(53%)和f / sub T / = 27 GHz(65%In);相应的f / sub max /变化范围是6.5至8 GHz)。随着In含量增加到70%,器件性能会下降。直流和微波特性表明存在高达2.7 GHz的负差分电阻(NDR)。

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