首页> 外文期刊>IEEE Transactions on Electron Devices >Ge/sub x/Si/sub 1-x//silicon inversion-base transistors: experimental demonstration
【24h】

Ge/sub x/Si/sub 1-x//silicon inversion-base transistors: experimental demonstration

机译:Ge / sub x / Si / sub 1-x //硅反转基晶体管:实验演示

获取原文
获取原文并翻译 | 示例

摘要

The fabrication, material characterization, and electrical evaluation of the p-channel Ge/sub x/Si/sub 1-x//silicon inversion-base transistor (BICFET) are described. The BICFET was one of the first bipolar devices to take advantage of the breakthroughs in advanced Ge/sub x/Si/sub 1-x//Si processing technology, to which its p-channel implementation is ideally suited. At this time, the performance limitations of the Ge/sub x/Si/sub 1-x//Si BICFET are set only by the current fabrication technology, and not by limits imposed by its physical principles of operation. The electrical results presented include both the unipolar characteristics, in which the BICFET is configured as a heterojunction FET, and the bipolar characteristics, which is the intended high-performance mode of operation. The experimental results presented are in good agreement with theoretical study.
机译:描述了p沟道Ge / sub x / Si / sub 1-x //硅反型基极晶体管(BICFET)的制造,材料表征和电气评估。 BICFET是最早利用先进的Ge / sub x / Si / sub 1-x // Si处理技术突破的双极器件之一,其p沟道实现非常适合。此时,Ge / sub x / Si / sub 1-x // Si BICFET的性能限制仅由当前的制造技术设置,而不受其物理工作原理所施加的限制。给出的电学结果包括将BICFET配置为异质结FET的单极特性和预期的高性能工作模式双极特性。实验结果与理论研究吻合良好。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号