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A self-aligned gate GaAs MESFET with p-pocket layers for high-efficiency linear power amplifiers

机译:具有p型口袋层的自对准栅极GaAs MESFET,用于高效线性功率放大器

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This paper describes a newly developed GaAs metal semiconductor field-effect transistor (MESFET)-termed p-pocket MESFET-for use as a linear power amplifier in personal handy-phone systems. Conventional buried p-layer technology, the primary technology for microwave GaAs power MESFET's, has a drawback of low power efficiency for linear power applications. The low power efficiency of the buried p-layer MESFET is ascribed to the I-V kink which is caused by holes collected in the buried p-layer under the channel. In order to overcome this problem, we have developed the self-aligned gate p-pocket MESFET which incorporates p-layers not under the channel but under the source and drain regions. This new MESFET exhibited high transconductance and uniform threshold voltage. The problematic I-V kink was successfully removed and an improved power efficiency of 48% was achieved under bias conditions, which resulted in adjacent channel leakage power at 600-kHz offset as low as -59 dBc for 1.9-GHz /spl pi//4-shift QPSK modulated input.
机译:本文介绍了一种新开发的GaAs金属半导体场效应晶体管(MESFET),称为p型口袋MESFET,可用作个人手持电话系统中的线性功率放大器。传统的埋入p层技术是微波GaAs功率MESFET的主要技术,其缺点是线性功率应用的功率效率低。埋入p层MESFET的低功率效率归因于I-V扭结,这是由沟道下面的埋入p层中聚集的空穴引起的。为了克服这个问题,我们开发了自对准栅p型口袋MESFET,该晶体管在沟道以下但在源极和漏极区域下合并了p层。这种新的MESFET具有高跨导性和均匀的阈值电压。成功消除了有问题的IV扭结,并在偏置条件下将功率效率提高了48%,这导致在1.9 GHz / spl pi // 4-时600 kHz偏移下的邻道泄漏功率低至-59 dBc移位QPSK调制输入。

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