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A calibrated lumped-element de-embedding technique for on-wafer RF characterization of high-quality inductors and high-speed transistors

机译:一种校准的集总元件去嵌入技术,用于高质量电感器和高速晶体管的晶圆上RF表征

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摘要

The impedance errors remaining after conventional de-embedding for a high-speed transistor and a single-loop inductor test structure are investigated. A new de-embedding strategy using a physics-based lumped-element model for the test-structure parasitics calibrated on the frequency-dependent "open" and "short" dummy impedances is described, which reduces the experimental uncertainty on the de-embedded figures of merit. Using this new "calibrated lumped-element" de-embedding technique, we have been able to increase the "worst-case" values for the quality factor Q of a 0.6-nH 10-GHz single-loop inductor from 15 to 20 and for the f/sub max/ of a high-speed SiGe bipolar transistor from 80 to 110 GHz. The de-embedding technique presented here is of great importance to develop confidence in on-wafer S-parameter measurements taken at ever increasing microwave frequencies.
机译:研究了常规去嵌入高速晶体管和单回路电感器测试结构后残留的阻抗误差。描述了一种新的去嵌入策略,该方法使用基于物理的集总元素模型对基于频率的“开放”和“短”虚拟阻抗进行校准的测试结构寄生进行了描述,从而降低了去嵌入图形的实验不确定性功绩。使用这种新的“校准集总元件”去嵌入技术,我们已经能够将0.6nH 10 GHz单回路电感器的品质因数Q的“最坏情况”值从15增加到20 80至110 GHz的高速SiGe双极晶体管的f / sub max /。此处介绍的去嵌入技术对于在不断增加的微波频率下进行的晶圆上S参数测量中的置信度至关重要。

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