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Base-transit-time model considering field dependent mobility for BJTs operating at high-level injection

机译:考虑高强度注入操作的BJT的场相关迁移率的基本穿越时间模型

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An analytical model for the base transit time /spl tau//sub b/ for an exponentially doped base is developed assuming a small change in electron concentration in the base of a bipolar junction transistor at high injection from its low injection value. The model is valid in all levels of injection before the onset of the Kirk effect. In this analysis, bandgap-narrowing effect, high-injection effect, and carrier velocity saturation at the base edge of the base-collector junction, and also doping and field dependence of mobility, are incorporated. The base transit time calculated analytically is compared with simulation and numerical results, and also with experimental data in order to demonstrate the validity of the assumptions made in deriving the expression. The base transit time is found to be different if the field dependent mobility is considered.
机译:假设双极结晶体管的基极中的电子浓度从低注入值开始有小幅变化,那么就建立了指数掺杂基极的基跃迁时间/ splau / subb /的分析模型。该模型在柯克效应发作之前的所有注射水平均有效。在此分析中,结合了带隙变窄效应,高注入效应和基极-集电极结基极边缘处的载流子速度饱和,以及掺杂和迁移率的场依赖性。将解析计算出的基本渡越时间与仿真和数值结果以及实验数据进行比较,以证明推导表达式时所作假设的有效性。如果考虑到与场有关的迁移率,则发现基本渡越时间是不同的。

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