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How to Extract the Sheet Resistance and Hall Mobility From Arbitrarily Shaped Planar Four-Terminal Devices With Extended Contacts

机译:如何从具有扩展触点的任意形状的平面四端子设备中提取薄层电阻和霍尔迁移率

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Van der Pauw's method enables the sheet resistance $R_{rm sq}$ and the Hall mobility $mu_{rm H}$ to be extracted from arbitrarily shaped simply connected planar samples with four peripheral pointlike contacts. This paper generalizes the method for devices with extended contacts. It is found that $R_{ rm sq}$ and $mu_{rm H}$ can be extracted using only six resistance measurements in the absence of a magnetic field and a single magnetic sensitivity measurement. Conversely, if the $mu_{rm H}$ of a simply connected planar conducting device with peripheral contacts is known, the magnetic sensitivity of the device can be predicted based on six resistance measurements in the absence of a magnetic field, without any further knowledge of the device geometry. The new method is applied to a variety of differently shaped diffused silicon $n$-wells with peripheral contacts. The extracted sheet resistance and Hall mobility values show excellent consistency and are in agreement with the fabrication specifications.
机译:Van der Pauw的方法使薄层电阻$ R_ {rm sq} $和霍尔迁移率$ mu_ {rm H} $能够从具有四个外围点状触点的任意形状简单连接的平面样本中提取出来。本文概述了扩展触点设备的方法。已经发现,在不存在磁场的情况下仅使用六个电阻测量值和一次磁灵敏度测量值就可以提取$ R_ {rm sq} $和$ mu_ {rm H} $。相反,如果已知带有外围触点的简单连接的平面导电设备的$ mu_ {rm H} $,则可以在没有磁场的情况下基于六次电阻测量来预测设备的磁灵敏度,而无需任何进一步的知识设备几何形状。该新方法被应用于各种带有外围触点的形状不同的扩散硅$ n $-阱。提取的薄层电阻和霍尔迁移率值显示出极好的一致性,并且与制造规范一致。

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