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首页> 外文期刊>Solid-State Electronics >Closed form expressions for sheet resistance and mobility from Van-der-Pauw measurement on 90 degrees symmetric devices with four arbitrary contacts
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Closed form expressions for sheet resistance and mobility from Van-der-Pauw measurement on 90 degrees symmetric devices with four arbitrary contacts

机译:带有四个任意触点的90度对称设备上Van-der-Pauw测量的薄层电阻和迁移率的闭合形式表达式

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摘要

Sheet resistance and Hall mobility are commonly measured by Van der Pauw's method. Closed form expressions are known for four point-sized contacts. Recently, for devices with fourfold rotational symmetry a closed form expression for the sheet resistance was given for contacts of arbitrary size. In this paper we discuss its accuracy, link it to the equivalent circuit diagram of the device, and add another expression that determines the Hall mobility with 0.02% accuracy. (C) 2015 Elsevier Ltd. All rights reserved.
机译:薄层电阻和霍尔迁移率通常通过Van der Pauw方法测量。对于四个点大小的联系人,已知闭合形式的表达式。近来,对于具有四重旋转对称性的装置,对于任意尺寸的触点给出了薄层电阻的闭合形式表达式。在本文中,我们讨论了它的精度,将其链接到该器件的等效电路图,并添加了另一个表达式,以0.02%的精度确定霍尔迁移率。 (C)2015 Elsevier Ltd.保留所有权利。

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