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Effect of Tapered Interelectrode Gap Region on Pseudospark-Sourced Electron Beam Emission

机译:锥形电极间隙区域对Pseudospark型电子束发射的影响

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In this article, a comparative experimental and simulations analysis has been carried out to understand the role of tapered gap region on current density and energy of pseudospark (PS)-based electron beam emission. These studies have been performed for 5-gap and 8-gap regions in a tapered multigap multiaperture-based PS electron beam source, keeping the same electron beam fill factor, and other geometrical parameters identical. The source has been operated in a self-breakdown mode. Around four-times increase in the beam current has been observed in the 8-gap case at the fixed applied gap potential ranging between 20 and 25 kV, whereas the tapered interelectrode gap angle has been reduced from 7.5 degrees to 4.5 degrees. The field penetration inside the hollow cathode cavity and tapered region have also been analyzed using simulations, and the obtained results are explained based on built-up space charge in these regions.
机译:在本文中,已经进行了比较实验和模拟分析,以了解锥形间隙区域对伪气柱(PS)基的电流密度和能量的作用。这些研究已经在基于锥形的Multigap多消极的PS电子束源中进行了5间隙和8间隙区域,保持相同的电子束填充因子,以及其他几何参数相同。源已以自击域模式运行。在8个间隙壳体中在固定施加的间隙电位范围内的8-间隙壳体中观察到横梁电流增加约四倍,而锥形电极间隙角从7.5度降低到4.5度。使用模拟还分析了中空阴极腔和锥形区域内的磁场穿透,并且基于这些区域中的内置空间电荷来解释所得到的结果。

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