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Review on SiC MOSFETs High-Voltage Device Reliability Focusing on Threshold Voltage Instability

机译:以阈值电压不稳定性为重点的SiC MOSFET高压器件可靠性研究

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摘要

An overview over issues and findings in SiC power MOSFET reliability is given. The focus of this article is on threshold instabilities and the differences to Si power MOSFETs. Measurement techniques for the characterization of the threshold voltage instabilities are compared and discussed. Modeling of the threshold voltage instabilities based on capture-emission-time (CET) maps is a central topic. This modeling approach takes the complete gate bias/temperature history into account. It includes both gate stress polarities and is able to reproduce the short-term threshold variations during application-relevant 50-kHz bipolar ac-stress. In addition, the impact on circuit operation is discussed.
机译:给出了有关SiC功率MOSFET可靠性问题和发现的概述。本文的重点是阈值不稳定性以及与Si功率MOSFET的区别。比较和讨论了表征阈值电压不稳定性的测量技术。基于捕获发射时间(CET)映射对阈值电压不稳定性进行建模是一个中心主题。这种建模方法考虑了完整的栅极偏置/温度历史。它既包括栅极应力极性,又能够在与应用相关的50kHz双极性交流应力期间重现短期阈值变化。此外,还讨论了对电路操作的影响。

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