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Temperature dependence of high-frequency performance of AlGaAs/InGaAs pseudomorphic HEMT's

机译:AlGaAs / InGaAs伪晶HEMT高频性能的温度依赖性

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High-frequency measurements of 1.5- mu m gatelength AlGaAs/InGaAs pseudomorphic HEMTs have been performed at temperatures ranging from 77 to 463 K. A 28% increase and 27% decrease in f/sub T/ were observed by changing the temperature from 300 to 77 K and from 300 to 463 K, respectively. The effective saturation velocity evaluated from the total delay time, 1/2 pi f/sub T/, versus reciprocal I/sub DS/ relation reveals almost the same temperature dependence as f/sub T/. It is also shown that the temperature dependence is similar to that of calculated velocity at high electric fields but not to that at low fields. This suggests that the temperature dependence of the HEMT performance is determined by that of the saturation velocity in the channel.
机译:在77至463 K的温度范围内对1.5μm栅长AlGaAs / InGaAs伪晶HEMT进行了高频测量。通过将温度从300°C更改为300°F,观察到f / sub T /分别提高了28%和27%。分别为77 K和300至463K。从总延迟时间1/2 pi f / sub T /评估的有效饱和速度与倒数I / sub DS /的关系揭示了与f / sub T /几乎相同的温度依赖性。还显示出温度依赖性与在高电场下计算出的速度相似,但与低电场下无关。这表明,HEMT性能的温度依赖性取决于通道中的饱和速度。

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