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Write-Once Diode/Antifuse Memory Element with a Sol-Gel Silica Antifuse Cured at Low Temperature

机译:具有低温固化的Sol-Gel二氧化硅反熔丝的一次写入二极管/反熔丝存储元件

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A write-once programmable memory element is based on a spin-coated sol-gel silica antifuse layer cured at 100℃. This antifuse is integrated with a thin-film silicon diode deposited at 160℃ by hot-wire chemical vapor deposition/When a 3 to 5 V electrical pulse is applied across a diode/antifuse element, the silica breaks down suddenly and the current passing through the element increases irreversibly by more than about 10{sup}4. The on-state exhibits a diode-like current-voltage characteristic with a forward-reverse asymmetry of nearly 100 at 1 V and is stable if there was hexamethyldisilazane treatment of the wet-gel film before curing.
机译:一次写入可编程存储元件基于在100℃固化的旋涂溶胶-凝胶二氧化硅反熔丝层。这种反熔丝与通过热线化学气相沉积在160℃下沉积的薄膜硅二极管集成在一起/当在二极管/反熔丝元件上施加3至5 V电脉冲时,二氧化硅突然击穿,电流通过元素不可逆地增加超过10 {sup} 4。导通状态表现出类似于二极管的电流-电压特性,在1 V时具有正反向不对称性,接近100,并且如果在固化前对湿凝胶膜进行六甲基二硅氮烷处理,则该导通状态是稳定的。

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