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On the Use of a SiGe Spike in the Emitter to Improve the $f_{T}hbox{xBV}_{rm CEO}$ Product of High-Speed SiGe HBTs

机译:关于在发射极中使用SiGe尖峰来改善高速SiGe HBT产品的$ f_ {T} hbox {xBV} _ {rm CEO} $产品

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Aggressive vertical scaling of SiGe HBTs has yielded impressive values for the cut-off frequencies (fT), but these HBTs often suffer from too high current gains. This leads to low values for the open-base breakdown voltage (BVCEO). In this letter we demonstrate the use of a SiGe spike in the emitter as a practical method to increase the base current. Hence, the breakdown voltage is increased. At the same time, the device RF performance is not affected, which leads to a significant improvement in the fTxBVCEO product
机译:SiGe HBT的激进垂直缩放已产生了令人印象深刻的截止频率(fT)值,但是这些HBT经常会受到电流增益过高的困扰。这导致开路击穿电压(BVCEO)的值较低。在这封信中,我们演示了在发射极中使用SiGe尖峰作为增加基极电流的实用方法。因此,击穿电压增加。同时,器件的射频性能不受影响,这导致fTxBVCEO产品的显着改善

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