首页> 外文期刊>IEEE Electron Device Letters >Effects of Oxide-Fixed Charge on the Breakdown Voltage of Superjunction Devices
【24h】

Effects of Oxide-Fixed Charge on the Breakdown Voltage of Superjunction Devices

机译:氧化物固定电荷对超结器件击穿电压的影响

获取原文
获取原文并翻译 | 示例

摘要

Superjunction devices may employ oxide layers for termination and for isolating adjacent pillars. Fixed charges present in these oxide layers are shown to have the following influence on the device breakdown voltage $V_{rm br}$. The effect of a positive fixed charge is equivalent to an increase in the n-pillar charge. The resulting charge imbalance degrades $V_{rm br}$, and can be compensated either by increasing the p-pillar doping or by decreasing the n-pillar doping by an amount $approx!(hbox{1.2}N_{rm fT} + hbox{4}N_{rm fI})/(hbox{pillar width})$, where $N_{rm fT}$ and $N_{rm fI}$ are the fixed charges in the termination and isolation oxides, respectively. Contrary to expectation, the $V_{rm br}$ of such compensated devices can be significantly higher than that of a balanced superjunction of the same doping level without fixed charge, due to the uniform lateral depletion effect of the fixed charge.
机译:超结器件可以采用氧化物层进行端接并隔离相邻的柱。这些氧化物层中存在的固定电荷显示出对器件击穿电压$ V_ {rm br} $具有以下影响。正固定电荷的作用等同于n柱电荷的增加。由此产生的电荷不平衡会降低$ V_ {rm br} $,并且可以通过增加p柱掺杂或通过将n柱掺杂减少约$来补偿(hbox {1.2} N_ {rm fT} + hbox {4} N_ {rm fI})/(hbox {支柱宽度})$,其中$ N_ {rm fT} $和$ N_ {rm fI} $是端接氧化物和隔离氧化物中的固定电荷。与预期相反,由于固定电荷的均匀侧向耗尽效应,这种补偿器件的$ V_ {rm br} $可以显着高于没有固定电荷的相同掺杂水平的平衡超结的值。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号