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首页> 外文期刊>Electron Device Letters, IEEE >Retention Performance of Ferroelectric Polymer Film for Nonvolatile Memory Devices
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Retention Performance of Ferroelectric Polymer Film for Nonvolatile Memory Devices

机译:非易失性存储器件中铁电聚合物膜的保留性能

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摘要

For nonvolatile memory devices, capacitors with metal-ferroelectric-metal structures were fabricated using poly(vinylidene fluoride-trifluoroethylene) as a ferroelectric layer, and performance was estimated in terms of retention property. In the same thickness, the polarization retained longer as the writing pulsewidth (PW) was extended. With the same writing PW, a thicker capacitor maintained a polarized state longer. In conclusion, the performance for operating voltage, operating frequency, and data retention time is expected.
机译:对于非易失性存储器件,使用聚偏二氟乙烯-三氟乙烯作为铁电层来制造具有金属铁电金属结构的电容器,并根据保持性能来评估性能。在相同的厚度下,极化随着写入脉冲宽度(PW)的延长而保持更长的时间。在相同的写入功率下,较厚的电容器可以保持更长的极化状态。总而言之,可以预期工作电压,工作频率和数据保留时间的性能。

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