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机译:非易失性存储器件中铁电聚合物膜的保留性能
Div. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea;
MIM devices; capacitors; dielectric polarisation; dielectric thin films; ferroelectric capacitors; ferroelectric materials; polymer films; random-access storage; thin film capacitors; data retention time; ferroelectric polymer film; metal-ferroelectric-metal structures; nonvolatile memory devices; operating frequency; operating voltage; polarization; poly(vinylidene fluoride-trifluoroethylene); writing pulsewidth; Depolarization; ferroelectric; hysteresis; low voltage; metal–ferroelectric–metal (MFM) structure; retention; writing pulsewidth (PW);
机译:Ba(Zr 0.1 sub> Ti 0.9 sub>)O 3 sub>铁电薄膜在各种保留周期下的开关特性,用于非易失性存储器件
机译:Ba(Zr_(0.1)Ti_(0.9))O_3铁电薄膜在不同保留周期下的开关特性,用于非易失性存储器件
机译:ZnO沟道厚度对带有Al2O3和铁电聚合物双层栅极绝缘体的非易失性存储薄膜晶体管器件性能的影响
机译:BA(Zr_(0.1)Ti_(0.9))O_3薄膜的铁电特性在退火后处理,用于非易失性存储器件中的应用
机译:用于铁电非易失性存储应用的铌酸锂薄膜的处理和表征。
机译:夹有超薄铁电薄膜的出色低压操作柔性铁电有机晶体管非易失性存储器
机译:非易失性有机存储器件的聚合物铁电纳米结构的激光制备
机译:用于开发非易失性,超高密度,快速,低电压,辐射 - 硬核存储器的原子光滑外延铁电薄膜