首页> 外文期刊>Electron Device Letters, IEEE >Comparison of Junctionless and Conventional Trigate Transistors With $L_{g}$ Down to 26 nm
【24h】

Comparison of Junctionless and Conventional Trigate Transistors With $L_{g}$ Down to 26 nm

机译:具低至26 nm的$ L_ {g} $的无结三极管和常规三极管晶体管的比较

获取原文
获取原文并翻译 | 示例

摘要

Junctionless accumulation-mode (JAM) devices with channel lengths $L_{g}$ down to 26 nm were fabricated on a trigate process and compared to conventional inversion-mode (IM) devices. This letter represents the first experimental comparison of short-channel JAM-to-IM devices at matched off-state leakage $(I_{rm off})$ . The JAM devices show better channel mobility (when moderately doped) and lower gate capacitance than the IM control counterparts at matched $I_{rm off}$. However, the JAM devices also show reduced gate control and degraded short-channel characteristics. The observed degraded behavior of JAM relative to IM is explained with the aid of device simulations and a simple analytic model of the channel charge.
机译:在三栅极工艺上制造了沟道长度为$ L_ {g} $至26 nm的无结累积模式(JAM)器件,并将其与传统的反转模式(IM)器件进行了比较。这封信代表了在匹配的断态泄漏$(I_ {rm off})$时,短通道JAM到IM设备的首次实验比较。与IM控制对应的$ I_ {rm off} $相比,JAM器件具有更好的沟道迁移率(适度掺杂时)和更低的栅极电容。但是,JAM设备还显示出降低的栅极控制和降低的短通道特性。借助设备仿真和简单的信道电荷分析模型,可以解释相对于IM观察到的JAM降级行为。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号