首页> 外文期刊>Electron Device Letters, IEEE >An Accurate Compact Model Considering Direct-Channel Interference of Adjacent Cells in Sub-30-nm nand Flash Technologies
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An Accurate Compact Model Considering Direct-Channel Interference of Adjacent Cells in Sub-30-nm nand Flash Technologies

机译:30 nm以下nand Flash技术中考虑相邻单元直接干扰的精确紧凑模型

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We propose an accurate compact model of nand Flash memory, which is fully compatible with a BSIM-4 model. In sub-30-nm nand Flash, adjacent cells directly affect the channel-edge potential of the selected cell. Due to such direct-channel interference, previous compact models cannot accurately simulate the characteristics of sub-30-nm nand strings. In this letter, we describe the interference as the threshold voltage variation due to adjacent cells and change the threshold voltage equation of the BSIM-4 model. The equation is semitheoretically derived. Using the proposed model, we simulated several behaviors of 27-nm nand Flash strings. The results show more than 90$%$ accuracy compared with the silicon measurements.
机译:我们提出了一个精确的紧凑型nand闪存模型,该模型与BSIM-4模型完全兼容。在低于30 nm的nand Flash中,相邻单元会直接影响所选单元的通道边缘电势。由于这种直接信道干扰,以前的紧凑型模型无法准确地模拟30 nm以下的nand串的特性。在这封信中,我们将干扰描述为由于相邻单元引起的阈值电压变化,并更改了BSIM-4模型的阈值电压方程。该方程是半理论推导的。使用提出的模型,我们模拟了27 nm nand Flash串的几种行为。结果表明,与硅测量结果相比,精度超过90%。

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