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InP-HEMT X-band Low-Noise Amplifier With Ultralow 0.6-mW Power Consumption

机译:具有0.6mW超低功耗的InP-HEMT X波段低噪声放大器

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We report a single-stage InP-high-electron-mobility-transistor (HEMT) X-band low-noise amplifier (LNA) featuring an ultralow dc power consumption at room temperature. The LNA was fabricated with the ETH Zürich 100-nm InP-HEMT MMIC coplanar waveguide process. When operated with a dc power consumption of only 0.6 mW, our LNA delivers a gain of 9.0 $pm$ 0.9 dB from 7 to 11 GHz with a minimum noise figure of 1.4 dB at 9.8 GHz. The excellent LNA performance is enabled by the favorable characteristics of our InP HEMTs under low-power-dissipation biases. For example, at a bias of $V_{rm DS} = hbox{0.5 V}$ and $I_{rm DS} = hbox{66.2 mA/mm}$, our $(hbox{0.1} times hbox{2} times hbox{50} mu hbox{m}^{2})$ InP HEMTs feature cutoff frequencies of $f_{T} = hbox{183 GHz}$ and $f_{rm MAX} = hbox{230 GHz}$ . The present results demonstrate the excellent capabilities of InP-HEMT technology for high-speed, low-voltage, and room-temperature low-power-consumption applications.
机译:我们报告了一种单级InP高电子迁移率晶体管(HEMT)X波段低噪声放大器(LNA),在室温下具有超低的直流功耗。 LNA是使用ETHZürich100 nm InP-HEMT MMIC共面波导工艺制造的。当直流功耗仅为0.6 mW时,我们的LNA在7至11 GHz范围内可实现9.0 $ pm $ 0.9 dB的增益,在9.8 GHz时的最小噪声系数为1.4 dB。在低功耗偏置下,我们的InP HEMT的良好特性可实现出色的LNA性能。例如,在$ V_ {rm DS} = hbox {0.5 V} $和$ I_ {rm DS} = hbox {66.2 mA / mm} $的偏差下,我们的$(hbox {0.1}乘以hbox {2}乘以hbox {50} mu hbox {m} ^ {2})$ InP HEMT的截止频率为$ f_ {T} = hbox {183 GHz} $和$ f_ {rm MAX} = hbox {230 GHz} $。目前的结果证明了InP-HEMT技术在高速,低压和室温下低功耗应用中的出色功能。

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