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首页> 外文期刊>IEEE Electron Device Letters >Design and Simulation of a Novel Graded-Channel Heterojunction Tunnel FET With High Ratio and Steep Swing
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Design and Simulation of a Novel Graded-Channel Heterojunction Tunnel FET With High Ratio and Steep Swing

机译:新型高比陡摆梯度通道异质结隧道FET的设计与仿真

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摘要

In this letter, a novel graded-channel heterojunction tunnel field-effect transistor (GCH-TFET) is proposed and studied by simulation. The novel TFET adopts a near broken-gap heterojunction at the source/channel interface to enhance the tunnel efficiency. Besides, it employs a graded component channel which works as an electron barrier to block up the leakage current at the OFF-state and can be removed with the increased gate voltage at the ON-state for high ON/ OFF-current ( ) ratio. Such graded channel also allows a sudden turn-on of band-to-band tunneling, resulting in a reduced sub-threshold swing (SS) compared with conventional heterojunction TFETs. The GCH-TFET demonstrates an ratio of more than seven decades with up to 225 at V, more than two decades lower than a near broken-gap heterojunction TFET and SS lower than 30 mV/decade for more than five decades, exhibiting excellent potential for ultra-low power applications.
机译:本文提出了一种新型的梯度沟道异质结隧道场效应晶体管(GCH-TFET),并进行了仿真研究。新型TFET在源极/通道接口处采用了近断间隙异质结,以提高隧道效率。此外,它采用了渐变的分量沟道,该沟道用作电子势垒以阻止截止状态下的泄漏电流,并且可以在导通状态下以增加的栅极电压将其去除,以实现高的导通/截止电流()比。与常规的异质结TFET相比,这种渐变通道还允许突然打开带间隧道,从而降低了亚阈值摆幅(SS)。 GCH-TFET的比率超过7个十年,在V时高达225,比近断隙异质结TFET降低了20多年,而SS低于30 mV /十年的SS则超过了50年,展现了极好的潜力。超低功耗应用。

著录项

  • 来源
    《IEEE Electron Device Letters》 |2017年第9期|1200-1203|共4页
  • 作者单位

    Key Laboratory of Microelectronics Devices and Circuits, Institute of Microelectronics, Peking University, Beijing, China;

    Key Laboratory of Microelectronics Devices and Circuits, Institute of Microelectronics, Peking University, Beijing, China;

    Key Laboratory of Microelectronics Devices and Circuits, Institute of Microelectronics, Peking University, Beijing, China;

    Key Laboratory of Microelectronics Devices and Circuits, Institute of Microelectronics, Peking University, Beijing, China;

    Key Laboratory of Microelectronics Devices and Circuits, Institute of Microelectronics, Peking University, Beijing, China;

    Key Laboratory of Microelectronics Devices and Circuits, Institute of Microelectronics, Peking University, Beijing, China;

    Key Laboratory of Microelectronics Devices and Circuits, Institute of Microelectronics, Peking University, Beijing, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    TFETs; Heterojunctions; Logic gates; Ions; Photonic band gap; Tunneling;

    机译:TFET;异质结;逻辑门;离子;光子带隙;隧道效应;

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