Deposition of Thin Films Composed of Fe81B13.5 Si3.5Co2 Material by PLD Method Using the ArF Excimer Laser

摘要

Depositions of thin films, composed of Fe81B13.5 Si3.5Co2 material were performed with ArF excimer laser (λ = 193 nm). The material, with expected large magnetoelastic coefficient is potentially applicable in sensor and actuator technology. Depositions were done on polished orientation Si substrates held at different temperatures: RT, 250C, 450C and 550C. Results of AFM, MFM, SEM, EDS and FTIR measurements of the layers as a function of process parameters, in particular of the substrate temperature, are presented.