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Method and apparatus for the thin film deposition of materials with a high power pulsed laser

机译:用高功率脉冲激光薄膜沉积材料的方法和设备

摘要

The present invention provides an apparatus and method for laser direct writing of materials onto a receiving substrate using a high power pulsed laser. The invention includes a pulsed laser light source, a receiving substrate, disposed opposite the pulsed laser light source, and an optically transparent source support substrate positioned between the receiving substrate and the pulsed laser light source, wherein a surface of the optically transparent source support substrate facing the receiving substrate has coated thereon a thin film of material to be deposited on the receiving substrate. Laser direct writing using the invention is accomplished by impinging the thin film of material with a pulsed laser light from the pulsed laser lightPPSTATEMENT OF GOVERNMENT INTERESTPPThe Government has rights in this invention pursuant to Contract No. N00024-85-C-5301 awarded by the Department of the Navy.
机译:本发明提供了一种使用大功率脉冲激光器将材料激光直接写入接收基板上的设备和方法。本发明包括脉冲激光光源,与脉冲激光光源相对设置的接收基板,以及位于该接收基板和脉冲激光光源之间的光学透明源支撑基板,其中该光学透明源支撑基板的表面面向接收基板的表面上涂覆有要沉积在接收基板上的材料的薄膜。通过使用来自脉冲激光的脉冲激光撞击材料薄膜来实现使用本发明的激光直接写入

政府利益声明

政府根据本发明享有权利海军部授予的合同号N00024-85-C-5301。

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