METHOD AND AN APPARATUS FOR PULSED LASER DEPOSITION USING DIELECTRIC BARRIER DISCHARGE AND A METAL OXIDE THIN FILM FABRICATED BY THE SAME METHOD

摘要

PURPOSE: A method and an apparatus for pulsed laser deposition using dielectric barrier discharge and a metal oxide thin film fabricated by the same method are provided to improve the doping efficiency by supplying nitrogen atom of the active state to a pulsed laser deposition apparatus.;CONSTITUTION: An apparatus for pulsed laser deposition using dielectric barrier discharge comprises a dielectric barrier discharge unit(110) and a pulsed laser deposition unit(120). The dielectric barrier discharge unit comprises a dielectric barrier tube(111), a metal electrode(112), and a gas supply area(113) and a RF generator. The dielectric barrier tube supplies a space for the micro discharge. The metal electrode is included within the dielectric barrier tube. The gas supply area supplies the air to the dielectric barrier tube for dissociating. The RF generator applies the power in the metal electrode. The pulsed laser deposition unit comprises a chamber(121), a substrate(122), a substrate holder(123), a target(124), a target holder(125) and a light source(126). The chamber supplies the growth space of the thin film.;COPYRIGHT KIPO 2010