Substrate independent highly metallic TiN films fabricated by pulsed laser depositionmethod for plasmonic device applications

摘要

Titanium nitride (TiN) has been one of the most investigatedcompound plasmonic materials so far.1,2 However, itsplasmonic properties are worse than noble metals whichhave been used conventionally. Even the TiN films fabricatedat high temperature on lattice matched substrateshave inferior plasmonic properties compared to noble metals.3 Indeed, so far the major advantages of TiN againstnoble metals are only cost.