Photoemission Spectroscopy Characterization of Attempts to Deposit MoO2Thin Film

摘要

Attempts to deposit molybdenum dioxide (MoO2) thin films have been described. Electronic structure of films, deposited by thermal evaporation of MoO2powder, had been investigated with ultraviolet photoemission and X-ray photoemission spectroscopy (UPS and XPS). The thermally evaporated films were found to be similar to the thermally evaporated MoO3films at the early deposition stage. XPS analysis of MoO2powder reveals presence of +5 and +6 oxidation states in Mo 3d core level along with +4 state. The residue of MoO2powder indicates substantial reduction in higher oxidation states while keeping +4 oxidation state almost intact. Interface formation between chloroaluminum phthalocyanine (AlPc-Cl) and the thermally evaporated film was also investigated.