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A novel lightly doped drain and source Carbon nanotube field effect transistor (CNTFET) with negative differential resistance

机译:具有负差分电阻的新型轻掺杂漏极和源极碳纳米管场效应晶体管(CNTFET)

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In this paper, we propose and evaluate a novel design of a lightly doped drain and source carbon nanotube field effect transistor (LDDS-CNTFET) with a negative differential resistance (NDR) characteristic, called negative differential resistance LDDS-CNTFET (NDR-LDDS-CNTFET). The device was simulated by using a non equilibrium Green’s function method. To achieve this phenomenon, we have created two quantum wells in the intrinsic channel by using two n-type regions. In the wells that are separated by a thin barrier, two resonance states are generated. On the other hand, the thickness of the barrier between the source and the well is variable depending on the energy level. Accordingly, with increasing gate-source voltage, the number of tunneling electrons and consequently drain-source current are varied. Furthermore, we have presented a structure with two n-type and three p-type regions in the channel that illustrates a larger NDR region. In this structure, the peak and valley of the drain-source current are shifted when compared with the previous structure. Finally, we investigated the effect of doping concentration on the NDR parameter.
机译:在本文中,我们提出并评估了具有负差分电阻(NDR)特性的轻掺杂漏极和源极碳纳米管场效应晶体管(LDDS-CNTFET)的新颖设计,称为负差分电阻LDDS-CNTFET(NDR-LDDS- CNTFET)。通过使用非平衡格林函数方法对设备进行了仿真。为了实现这一现象,我们通过使用两个n型区域在本征通道中创建了两个量子阱。在被薄壁垒隔开的孔中,产生两个共振状态。另一方面,源和阱之间的势垒的厚度根据能量水平而变化。因此,随着栅极-源极电压的增加,隧道电子的数量以及因此漏极-源极电流发生变化。此外,我们提出了在通道中具有两个n型和三个p型区域的结构,该结构说明了较大的NDR区域。在这种结构中,与以前的结构相比,漏极-源极电流的峰值和谷值发生了偏移。最后,我们研究了掺杂浓度对NDR参数的影响。

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